微电子(单晶硅、多晶硅、太阳能电池、氧化铝坩埚)生产用水系统超水设备,余艳13073396006,QQ:674831270
微电子、电池工业用水处理设备
Pure water for Micro-electronics, batteries industrial
应用领域和指标要求参考
Reference of applications areas and indexes required
用途Applications
用水指标Water Indicators
参考标准Reference standard
单晶硅、多晶硅、太阳能电池、氧化铝坩埚、光伏玻璃等生产
Monocrystalline silicon, polycrystalline silicon, solar cells, alumina crucible, photovoltaic glass, and other production
电阻率15 ~18.25 MΩ.CM
Resitivity15 ~18.25 MΩ.CM
我国电子级水质技术指标,GB11446-1-1997
The water quality of China’s electronic-grade technical indicators GB11446-1-1997
美国半导体工业用水指标
The industrial pure water indicators of U.S. semiconductor
单晶硅半导体集成电路块,显像管、玻壳、液晶显示器等制造工业
Monocrystalline silicon semiconductor chips, tubes, glass, liquid crystal displays and other manufacturing industries
电阻率15 ~18.25 MΩ.CM
Resitivity15 ~18.25 MΩ.CM
美国半导体工业用水指标
The industrial pure water indicators of U.S. semiconductor
我国电子级水质技术指标,GB11446-1-1997
Chinese electronic-grade water quality technical specifications GB11446-1-1997
光学材料清洗用水、电子陶瓷行业用水、磁性材料用水
Pure water for optical materials, electronic ceramics and cutting-edge magnetic materials
电阻率10 ~17 MΩ.CM
Resitivity10 ~17 MΩ.CM
我国电子级水质技术指标,GB11446-1-1997
Chinese electronic-grade water quality technical specifications GB11446-1-1997
美国半导体工业用水指标
The industrial pure water indicators of U.S. semiconductor
蓄电池、锂电池、锌锰电池生产
Batteries, lithium batteries, zinc-manganese battery production
电阻率5 ~10 MΩ.CM
Resitivity5 ~10 MΩ.CM
我国电子级水质技术指标,GB11446-1-1997
Chinese electronic-grade water quality technical specifications GB11446-1-1997
有色金属、贵金属冶炼用水、纳米级新材料生产用水、航空新材料生产用水、ITO导电玻璃制造用水、电子级无尘布生产用水
Pure water for non-ferrous metals, precious metals smelting, nano-scale production of new materials, aviation and production of new materials, ITO conductive glass, production of electronic-grade for dust-free cloth
电阻率15 ~18.25 MΩ.CM
Resitivity15 ~18.25 MΩ.CM